ECASIA'09 - 13th European Conference on Applications of Surface and Interface Analysis - ECASIA'09 - 13th European Conference on Applications of Surface and Interface Analysis

Short Courses

Three short courses on practical surface analysis techniques will be held during the ECASIA'09 conference:

	Participant of ECASIA'09	NON Participant of ECASIA'09
2-day course on X-ray Photoelectron Spectroscopy (XPS/ESCA) Monday/Tuesday, October 19-20, 2009.	550 € for regular 200 € for students	800 € for regular 350 € for students
1-day course on nano-AES Thursday, October 22, 2009.	350 € for regular 125 € for students	500 € for regular 200 € for students
1-day course on Data Processing in XPS/ESCA and Auger Electron Spectroscopy Friday, October 23, 2009.	350 € for regular 125 € for students	500 € for regular 200 € for students
4-day package of all courses	1.200 € for regular 650 € for students

Non-participant to the conference: The fee covers the cost of lunch, registration and other activities (e.g. welcome reception...) for the day(s) short course.

Special Discount: Conferees registering for 4-day package will receive complimentary Conference registration.

Cancellations: Cancellations received in writing one month prior to the event will receive a full refund less 10% for administrative charges. Thereafter cancellation are not refundable, although participants can be substituted at any time.

The courses are given by
John T. Grant
Distinguished Research Scientist
Research Institute, University of Dayton
(see http://surfaceanalysis.org/)

COURSE DESCRIPTIONS

X-Ray Photoelectron Spectroscopy (XPS/ESCA) Monday/Tuesday, October 19-20, 2009.

XPS is used to determine the atoms present at a surface and their concentrations, chemistry, and lateral and depth distributions. This course emphasizes:

• The principles of XPS - production of photoelectrons, electron escape depth, surface sensitivity, plasmons, multiplet splitting and shake-up.
• Instrumentation - x-ray sources, satellites, analyzers, detectors, analyzed area, nonhomogeneous specimens, photoelectron diffraction, small-area analysis, and imaging.
• Qualitative analysis - identification of elements, energy scale calibration, interpretation of chemical shifts, relaxation effects, Auger parameteer, peak widths, and line shapes.
• Quantitative analysis - approaches, photoelectron cross-sections, asymmetry parameter, analyzer transmission, sensitivity factors, detection limitss, and the effect of thin overlayers.
• Artifacts - x-ray satellites, ghost peaks, x-ray damage, and specimen charging and handling.
• Data processing - analog and digital acquisition, background subtraction, measurement of peak area, x-ray satellite removal, curve-fitting, and deconvolution.
• Methods for depth profiling - angular studies, inelastic losses, and sputtering.
• Instrument selection.
• Applications to solve surface-related problems.

Nano Auger Electron Spectroscopy Thursday, October 22, 2009.

AES is used to determine the atoms present at a surface, their concentrations, and their lateral and depth distributions. Nano AES involves its application to the analysis of very small regions of a surface, including nano-size particles. Sputter depth profiles of nano-thickness thin films will also be included.Introduction – surfaces, types of surfaces.

• The principles of AES - production of Auger electrons, peak labeling, handbooks, books, surface sensitivity, information depth.
• Qualitative analysis – direct and derivative spectra, identification of elements, energy resolution, chemical effects, plasmons.
• Quantitative analysis – Auger intensities, sensitivity factors, detection limit, matrix factors, backscattering, angle of incidence and emission, diffraction.
• Instrumentation – field emission electron source, spatial resolution (beam), signal-to-noise, beam damage, cylindrical mirror analyzer (CMA), hemispherical type analyzer (HSA), pulse counting.
• Imaging and spatial resolution – scanning electron microscopy, acceptance area, locating regions of interest, corrections for topography and backscattering, beam energy, spatial resolution (analysis), comparison of analyzers, electron energy loss (EELS) imaging, ratioed scatter diagrams, line scans, image registration.
• Applications – nano analysis of spheres, particles, via holes, insulators, sputter depth profiles of nanolayers.
• Summary – general summary.

Data Processing in XPS/ESCA and AES, Friday, October 23, 2009

XPS and AES are used to determine the atoms present at a surface, and their concentrations, chemistries, and lateral and depth distributions. This course will show attendees how to process and evaluate XPS and AES spectra:

• Spectra- the many features present in spectra will be described.
• Background subtraction methods will be described and compared.
• Shapes of peaks will be described and approaches for curve fitting will be illustrated.
• Approaches for quantitative analysis will be demonstrated and errors illustrated.
• Data processing methods to improve images will be demonstrated.
• Data processing methods for near-surface, non-destructive depth profiling will be illustrated.
• Data processing methods to remove peak overlap problems, separate different chemical states, and improve signal-to-noise in sputter depth profiles will be demonstrated.